The Materials Science of Thin FilmsAcademic Press, 1992 - 704 páginas This textbook provides coverage of the science and technology of thin films and coatings. Developed for upper-level undergraduate and beginning graduate students, the book discusses physical and chemical vapour deposition processes; phenomena involving nucleation and growth, stress, diffusion and reaction; structural and chemical characterization techniques; and applications involving coatings, magnetic and optical recording materials, integrated optics and quantum devices. The book includes chapters on epitaxy and surface modification in addition to discussing emerging technologies such as diamond films and high T superconductors. Complete problem sets are provided at the end of each chapter to facilitate self-study. |
Índice
Chapter 2 | 49 |
Chapter 3 | 79 |
Chapter 6 | 80 |
Chapter 4 | 147 |
Chapter 5 | 195 |
Characterization of Thin Films | 249 |
Chapter 7 | 307 |
Chapter 8 | 355 |
Chapter 9 | 403 |
Chapter 10 | 451 |
Chapter 11 | 507 |
Chapter 12 | 547 |
Chapter 13 | 589 |
Chapter 14 | 629 |
Appendix 1 | 685 |
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Términos y frases comunes
adhesion alloy amorphous applications atoms beam bulk cathode chemical chemical vapor deposition coatings collisions composition compounds crystal density depends deposition rates devices dielectric diffraction diffusion dislocation effects electrical electron employed energy epitaxial films equation equilibrium evaporation example ferromagnetic field Figure film deposition film growth film thickness flow flux formation function GaAs gases heat insulating integrated circuits interdiffusion interface ion implantation ionized kinetic laser lattice layer LPCVD magnetic materials measure mechanical melt metal films molecules nitride nucleation occurs optical optical coatings oxide Permalloy phase plane plasma processes properties pump reactants reaction reactive reactor reflected refractive refractive index resistance Schematic semiconductor shown in Fig silicide silicon single-crystal SiO2 solid sputter yields sputtering stoichiometry stress structure substrate substrate temperature superconducting surface target techniques thermal thermodynamic thin films tion torr typically vacuum values velocity voltage wavelength X-ray yields
Referencias a este libro
Thin Film Materials: Stress, Defect Formation and Surface Evolution L. B. Freund,S. Suresh Vista previa restringida - 2004 |
Fundamentals of Interfacial Engineering Robert J. Stokes,D. Fennell Evans Vista previa restringida - 1996 |